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Publications by A. N. Chandorkar
Growth Kinetics of Silicon Dioxide on Silicon in an Inductively Coupled Rf Plasma at Constant Anodization Currents
Journal of Applied Physics
Astronomy
Physics
Related publications
Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
International Journal of Photoenergy
Materials Science
Renewable Energy
Molecular Physics,
Sustainability
Atomic
Chemistry
Optics
the Environment
Direct Analysis of Silicon in Molten Pig Iron by Inductively Coupled Plasma Emission Spectrometry
Tetsu-To-Hagane/Journal of the Iron and Steel Institute of Japan
Alloys
Condensed Matter Physics
Metals
Theoretical Chemistry
Materials Chemistry
Physical
Investigations of the Surface Chemistry of Silicon Substrates Etched in a Rf-Biased Inductively Coupled Fluorocarbon Plasma Using Fourier-Transform Infrared Ellipsometry
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Black Silicon With Ultra-Low Surface Recombination Velocity Fabricated by Inductively Coupled Power Plasma
Physica Status Solidi - Rapid Research Letters
Materials Science
Condensed Matter Physics
Inductive Currents in an Rf Driven Plasma
Influence of Silicon Wafer Crystallographic Orientation on Anodization Mechanism
Doklady BGUIR
Remote Plasma Etching of Silicon Nitride and Silicon Dioxide Using NF3/O2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Thickness-Dependent Stress in Plasma-Deposited Silicon Dioxide Films
Journal of Applied Physics
Astronomy
Physics
