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Publications by Arito Ogawa
Effects of Aluminum and Nitrogen Profile Control on Electrical Properties of HfAlON Gate Dielectric MOSFETs
Related publications
Frequency and Gate Voltage Effects on the Dielectric Properties and Electrical Conductivity of Al/SiO2/P-Si Metal-Insulator-Semiconductor Schottky Diodes
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Electrical Characteristics and Reliability Properties of Metal-Oxide-Semiconductor Field-Effect Transistors With La2O3 Gate Dielectric
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Electrical Conduction and Dielectric Breakdown in Aluminum Oxide Insulators on Silicon
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Improved Electrical Properties of Metal-Oxide-Semiconductor Capacitor With HfTiON Gate Dielectric by Using HfSiON Interlayer
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Sub-Micron, Metal Gate, High-к Dielectric, Implant-Free, Enhancement-Mode III-V Mosfets
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Improved Electrical Properties of Ge Metal-Oxide-Semiconductor Capacitor With HfTa-based Gate Dielectric by Using TaOxNy Interlayer
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Influence of Physical and Geometrical Parameters on Electrical Properties of Short Gate GaAs MESFETs
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Electrical Properties of Crystalline YSZ Films on Silicon as Alternative Gate Dielectrics
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