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Publications by Bi Jian Zeng

Metallic Resist for Phase-Change Lithography

Scientific Reports

Multidisciplinary

English

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Evaluation of Resist Capability for EUV Lithography

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Metal Containing Resist Readiness for HVM EUV Lithography

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Immersion Lithography: Topcoat and Resist Processes

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Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

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Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.

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Evaluation of EUV Resist Performance Using Interference Lithography

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O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography

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Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

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SEM Imaging of Resist Patterns Fabricated Through Imprint Lithography Techniques

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