Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Craig Higgins
Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
EUV Lithography
Synchrotron Radiation News
High Energy Physics
Nuclear
Optics
Atomic
Molecular Physics,
Current Status of EUV Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Progress in EUV Resists Towards High-Na EUV Lithography
EUV Lithography and Exposure Tool.
Journal of Plasma and Fusion Research
Low-Ler Tin Carboxylate Photoresists Using EUV
Secondary Electrons in EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
EUV Light Sources for Next-Gen Lithography
Optics and Photonics News
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Optics
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Development of Source System for EUV Lithography.
The Review of Laser Engineering
