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Low-Ler Tin Carboxylate Photoresists Using EUV
doi 10.1117/12.2086597
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Date
March 19, 2015
Authors
Ryan Del Re
Miriam Sortland
James Pasarelli
Brian Cardineau
Yasin Ekinci
Michaela Vockenhuber
Mark Neisser
Daniel Freedman
Robert L. Brainard
Publisher
SPIE
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