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Publications by D. Kosemura
Tensor Evaluation of Anisotropic Stress Relaxation in Mesa-Shaped SiGe Layer on Si Substrate by EBSP
Measurements of Anisotropic Biaxial Stresses in X = 0.15 and 0.30 Si1-xGex Nanostructures by Oil-Immersion Raman Spectroscopy
Related publications
Thermophysics Simulation of Laser Recrystallization of High-Ge-Content SiGe on Si Substrate
Advances in Condensed Matter Physics
Condensed Matter Physics
Fast Time Response From Si–SiGe Undulating Layer Superlattices
Applied Physics Letters
Astronomy
Physics
Characterization of Si/SiGe Heterostructures on Si Formed by Solid Phase Reaction
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Study of Strain Relaxation in Si/SiGe Metal-Oxide-Semiconductor Field-Effect Transistors
Journal of Applied Physics
Astronomy
Physics
Plasma Hydrogenation of Strain-Relaxed SiGe∕Si Heterostructure for Layer Transfer
Applied Physics Letters
Astronomy
Physics
Equivalent Stress Tensor and Anisotropic Failure Criterion of Soils
DEStech Transactions on Materials Science and Engineering
Novel 14-Nm Scallop-Shaped FinFETs (S-FinFETs) on Bulk-Si Substrate
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
Novel 14-Nm Scallop-Shaped FinFETs (S-FinFETs) on Bulk-Si Substrate
Evaluation of Microjoining Properties by EBSP Analysis
Yosetsu Gakkai Shi/Journal of the Japan Welding Society
Mechanics of Materials
Surfaces
Alloys
Mechanical Engineering
Metals
Films
Coatings
