Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by D. Nirmal
A Review of Nanoscale Channel and Gate Engineered FINFETs for VLSI Mixed Signal Applications Using Zirconium - Di - Oxide Dielectrics
Journal of Engineering Science and Technology Review
Engineering
Related publications
Degradation of Polycrystalline HfO2-based Gate Dielectrics Under Nanoscale Electrical Stress
Applied Physics Letters
Astronomy
Physics
Failure Analysis Using IDD Current Leakage and Photo Localization for Gate Oxide Defect of CMOS VLSI
Graphene Oxide/Polystyrene Bilayer Gate Dielectrics for Low-Voltage Organic Field-Effect Transistors
Applied Sciences (Switzerland)
Instrumentation
Materials Science
Fluid Flow
Engineering
Computer Science Applications
Process Chemistry
Transfer Processes
Technology
Proton Conducting Graphene Oxide/Chitosan Composite Electrolytes as Gate Dielectrics for New-Concept Devices
Scientific Reports
Multidisciplinary
Physical Insights on Design and Modeling of Nanoscale FinFETs
High-Mobility and Hysteresis-Free Flexible Oxide Thin-Film Transistors and Circuits by Using Bilayer SolGel Gate Dielectrics
Materials Fundamentals of Gate Dielectrics
Nonvolatile Polycrystalline Silicon Thin-Film-Transistor Memory With Oxide/Nitride/Oxide Stack Gate Dielectrics and Nanowire Channels
Applied Physics Letters
Astronomy
Physics
Challenges of Electrical Measurements of Advanced Gate Dielectrics in Metal-Oxide-Semiconductor Devices
AIP Conference Proceedings
Astronomy
Physics