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Publications by D.F. Storm
AlN/GaN Insulated Gate HEMTs With HfO2 Gate Dielectric
Electronics Letters
Electronic Engineering
Electrical
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Gate-Defined Quantum-Dot Devices Realized in InGaAs/InP by Incorporating a HfO2 Layer as Gate Dielectric
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The Characteristics of Hole Trapping in HfO2∕SiO2 Gate Dielectrics With TiN Gate Electrode
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Modelling of Insulated-Gate Field-Effect Transistors.
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