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Publications by Daniel A. Freedman
Platinum and Palladium Oxalates: Positive-Tone Extreme Ultraviolet Resists
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
High-Sensitivity Molecular Organometallic Resist for EUV (MORE)
Related publications
Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Extreme Ultraviolet Interferometry
Dissolution Inhibition in Positive Novolak Resists
Extreme Ultraviolet Multilayer Reflectors
AIP Conference Proceedings
Astronomy
Physics
Extreme Ultraviolet Alignment and Testing of a Four-Mirror Ring Field Extreme Ultraviolet Optical System
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Ammonia Formation Over Supported Platinum and Palladium Catalysts
Applied Catalysis B: Environmental
Technology
Catalysis
Process Chemistry
Environmental Science
Terbium-Based Extreme Ultraviolet Multilayers
Optics Letters
Optics
Atomic
Molecular Physics,
