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Publications by Hiroaki NIWA

Hard Carbon Film Coating by Plasma CVD.

SHINKU
1988English

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Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD

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Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.

SHINKU
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A MULTI-LAYER CVD-SiC COATING FOR OXIDATION PROTECTION OF CARBON/CARBON COMPOSITE

Zairyo/Journal of the Society of Materials Science, Japan
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Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.

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Amorphous Film Coating by Low Pressure Plasma Spraying. Application of Plasma Spraying With Functional Materials.

Journal of the Surface Finishing Society of Japan
1990English

Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation

1989English

Preparation of Crystallized Carbon Nitride Based on Microwave Plasma CVD-Effect of Carbon Source and H2 Addition to Gas System on Film Properties-

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CVD Carbon Powders Modified by Ball Milling

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