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Publications by Hisaki TARUI
High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus With Rotary Electrode.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
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Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
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Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
Plasma Sources Science and Technology
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Deposition of Siox Oxygen Barrier Films by Atmospheric Pressure Plasma Jet
Heavy Arsenic Doping of Silicon Grown by Atmospheric Pressure Selective Epitaxial Chemical Vapor Deposition
Science and Technology of Advanced Materials
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Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
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Deposition of SiNx Thin Films by Atmospheric Pressure Glow Discharge Plasmas.
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Control of Crystallinity in Nanocrystalline Silicon Prepared by High Working Pressure Plasma-Enhanced Chemical Vapor Deposition
Advances in Materials Science and Engineering
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