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Publications by Huda S. Alkhaldi

Suppression of Ion-Implantation Induced Porosity in Germanium by a Silicon Dioxide Capping Layer

Applied Physics Letters

English

Related publications

Ion Implantation-Induced Layer Splitting of Semiconductors

English

Formation of Silicon Carbide in the Surface Layer of Metals by Dual High Energy Ion Implantation

Materials Transactions, JIM

English

Atomic Layer-By-Layer Epitaxy of Silicon and Germanium Using Flash Heating in CVD

Le Journal de Physique IV

English

Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS Application

English

Influence of Ge Ion Implantation Into Silicon Dioxide/Silicon Structure on Charge Accumulation Under Low–Energy Stationary Radiation

Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering

English

Suppression of InAs∕GaAs Quantum Dot Decomposition by the Incorporation of a GaAsSb Capping Layer

Applied Physics Letters

English

3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching

Advanced Functional Materials

Materials Science

Condensed Matter Physics

Electrochemistry

Magnetic Materials

English

Thermal Stability of Diamondlike Carbon Buried Layer Fabricated by Plasma Immersion Ion Implantation and Deposition in Silicon on Insulator

Journal of Applied Physics

English

Modification of Mechanical Properties of Silicon Nanocantilevers by Self-Ion Implantation

Applied Physics Letters

English