Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by I. Lauer
Comparison of Plasma Doping With Implant for High Performance SOI CMOS Fabrication
Related publications
High Functionalization of Dental Implant With Laser Fabrication
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
High-Performance Doping-Free Carbon-Nanotube-Based CMOS Devices and Integrated Circuits
Chinese Science Bulletin
A Study on High Temperature CMOS Circuits for Sensor Applications With SDB-SOI Wafer.
IEEJ Transactions on Sensors and Micromachines
Electronic Engineering
Electrical
Mechanical Engineering
Fabrication and Characterisation of High Resistivity SOI Substrates for Monolithic High Energy Physics Detectors
Solid-State Electronics
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Electronic
A 1.9 GHZ High Efficiency Class-F SOI CMOS Power Amplifier
Ultralow-Power CMOS/SOI Circuit Technology
IEEJ Transactions on Electronics, Information and Systems
Electronic Engineering
Electrical
Extremely-Thin SOI for Mainstream CMOS: Challenges and Opportunities
Comparison of Laser Performance for Diode-Pumped Tm:YLF of Various Doping Concentrations
Fabrication of Smart Electrochemical Sensor With CMOS Integrated Circuits
