Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by J. Rozen
Ultimate Scaling of High-K Gate Dielectrics: Current Status and Challenges
Related publications
Noise in Si and SiGe MOSFETs With High-K Gate Dielectrics
AIP Conference Proceedings
Astronomy
Physics
Lifetime of High-K Gate Dielectrics and Analogy With Strength of Quasibrittle Structures
Journal of Applied Physics
Astronomy
Physics
In-Plane-Gate Flexible Single-Crystalline Silicon Thin-Film Transistors With High-K Gate Dielectrics on Plastic Substrates
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
High K Dielectrics on High-Mobility Substrates: The Interface!
Electrochemical Society Interface
Electrochemistry
Materials Fundamentals of Gate Dielectrics
Challenges of Electrical Measurements of Advanced Gate Dielectrics in Metal-Oxide-Semiconductor Devices
AIP Conference Proceedings
Astronomy
Physics
High Performance ZnO Thin-Film Transistors Using High-Ҝ TiHfO Gate Dielectrics
Current Status and Challenges of Ion Imprinting
Journal of Materials Chemistry A
Materials Science
Chemistry
the Environment
Sustainability
Renewable Energy
Dependences of Device Performances on Interfacial Layer Materials of High-K MISFETs Due to Wave Function Penetration Into Gate Dielectrics