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Publications by K. K. S. Curreem

Comparison of Interfacial and Electrical Characteristics of HfO2 and HfAlO High-K Dielectrics on Compressively Strained Si1−xGex

Applied Physics Letters

English

Related publications

Improved Hole Mobilities and Thermal Stability in a Strained‐Si∕strained‐Si1−yGey∕strained‐Si Heterostructure Grown on a Relaxed Si1−xGex Buffer

Applied Physics Letters

English

HRTEM and EELS Analysis of Interfacial Reactions in Ti/Si1-xGex/Si(100)

Microscopy and Microanalysis

Instrumentation

English

Composition and Strain Contrast of Si1−xGex (X=0.20) and Si1−yCy (Y≤0.015) Epitaxial Strained Films on (100) Si in Annular Dark Field Images

Journal of Applied Physics

English

Degradation of Polycrystalline HfO2-based Gate Dielectrics Under Nanoscale Electrical Stress

Applied Physics Letters

English

Formation of High Quality Si1-xGex/Si Crystals Heterostructure Limited Area MBE Growth

English

Axially Graded Heteroepitaxy and Raman Spectroscopic Characterizations of Si1−xGex Nanowires

Applied Physics Letters

English

Influence of Strain on the Electrical Properties of Ge Channel in Modulation-Doped P-Si0.5Ge0.5/Ge/Si1-xGex Heterostructure

English

High K Dielectrics on High-Mobility Substrates: The Interface!

Electrochemical Society Interface

Electrochemistry

English

TEM Study of Silicide Formation and Microstructural Development of Ni/ Si1-xGex

Microscopy and Microanalysis

Instrumentation

English