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Influence of Strain on the Electrical Properties of Ge Channel in Modulation-Doped P-Si0.5Ge0.5/Ge/Si1-xGex Heterostructure

doi 10.7567/ssdm.1990.s-d-9
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Abstract

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Date

January 1, 1990

Authors
Hiroyuki EtohEiichi MurakamiAkio NishidaKiyokazu NakagawaMasanobu Miyao
Publisher

The Japan Society of Applied Physics


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