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Publications by Naoki Hirakawa
Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-Ended Poly(.ALPHA.-Methylstyrene).
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Dry Thermal Development of Negative Electron Beam Resist Polystyrene
Advances in Nano Research
Electronic Engineering
Mechanical Engineering
Optics
Fluid Flow
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Transfer Processes
Biotechnology
Composites
Electronic
Catalysis
Ceramics
Water Soluble and Metal-Containing Electron Beam Resist Poly(sodium 4-Styrenesulfonate)
Materials Research Express
Surfaces
Alloys
Plastics
Polymers
Metals
Optical
Biomaterials
Magnetic Materials
Films
Coatings
Electronic
A Novel Electron Beam Resist System Acid Catalized Conversion of Poly(di-T-Butoxysiloxane) Into Glass.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Electron Beam Lithography Using GaAs Oxidized Resist for GaAs/AlGaAs Ultrafine Structure Fabrication.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Sub-10-Nm Structures Written in Ultra-Thin HSQ Resist Layers Using Electron-Beam Lithography
Evaluation of EUV Resist Performance Using Interference Lithography