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Publications by P. E. Hellstrom
A Study of Low-Frequency Noise on High-K/Metal Gate Stacks With in Situ SiOx Interfacial Layer
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Metal-Gate-Induced Reduction of the Interfacial Layer in Hf Oxide Gate Stacks
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On the Nature of the Interfacial Layer in Ultra-Thin TiN/LaLuO3 Gate Stacks
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Low-Frequency Noise in High-K LaLuO3/TiN MOSFETs
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The Impact of Positive Bias Temperature Instabilities on Stacked High-K/Metal Gate Transistor With TiN Barrier Layer
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Dependences of Device Performances on Interfacial Layer Materials of High-K MISFETs Due to Wave Function Penetration Into Gate Dielectrics
Study of Si- And SiGe-on-Insulator Ω-Gate Nanowire PMOS FETs by Low-Frequency Noise Measurements
