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Publications by Pan Kwi Park
Interface Effect on Dielectric Constant of HfO2∕Al2O3 Nanolaminate Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Applied Physics Letters
Astronomy
Physics
Related publications
Study on Deposition of Al2O3 Films by Plasma-Assisted Atomic Layer With Different Plasma Sources
Plasma Science and Technology
Condensed Matter Physics
Electrical Characterization of Amorphous LiAlO2 Thin Films Deposited by Atomic Layer Deposition
RSC Advances
Chemistry
Chemical Engineering
Excellent Resistive Switching Properties of Atomic Layer-Deposited Al2O3/HfO2/Al2O3 Trilayer Structures for Non-Volatile Memory Applications
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
Silicon Surface Passivation by Atomic Layer Deposited Al2O3
Journal of Applied Physics
Astronomy
Physics
Growth and Interface of HfO2 Films on H-Terminated Si From a TDMAH and H2O Atomic Layer Deposition Process
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3Thin Films
ACS Applied Materials & Interfaces
Medicine
Materials Science
Nanotechnology
Nanoscience
Effect of Substrate Pretreatments on the Atomic Layer Deposited Al2O3 Passivation Quality
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Comparison of Thermal and Plasma-Enhanced Atomic Layer Deposition of Niobium Oxide Thin Films
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Bipolar Resistive Switching Characteristics of Low Temperature Grown ZnO Thin Films by Plasma-Enhanced Atomic Layer Deposition
Applied Physics Letters
Astronomy
Physics
