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Publications by Patrick P. Naulleau
In-Situ Testing of High Resolution Optical Systems via Localized Wavefront Curvature Sensing
Mask Roughness Induced LER: A Rule of Thumb
22X Mask Cleaning Effects on EUV Lithography Process and Lifetime
Out of Band Radiation Effects on Resist Patterning
Low-Speckle Holographic Beam Shaping of High-Coherence EUV Sources
Mask Roughness Induced LER: Geometric Model at Long Correlation Lengths
Absorber Height Effects on SWA Restrictions and Shadow LER
Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
A High-Throughput Contact-Hole Resolution Metric for Photoresists: Full-Process Sensitivity Study
Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists
