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Publications by Roger P. Chu
Improved Environmental Stability for Plasma Enhanced Chemical Vapor Deposition SiO2waveguides Using Buried Channel Designs
Optical Engineering
Engineering
Optics
Atomic
Molecular Physics,
Related publications
Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Active and Passive Electronic Components
Electronic Engineering
Optical
Electrical
Magnetic Materials
Electronic
In Situfluorine-Modified Organosilicate Glass Prepared by Plasma Enhanced Chemical Vapor Deposition
Journal of Applied Physics
Astronomy
Physics
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Thermal Plasma Chemical Vapor Deposition of SiC.
ISIJ International
Mechanics of Materials
Alloys
Materials Chemistry
Metals
Mechanical Engineering
Causes of Anomalous Solid Formation in the Exhaust Systems of Low-Pressure Chemical Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition Semiconductor Processes
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Characteristics of Diamondlike Carbon Film Deposited by Magnetron Plasma Enhanced Chemical Vapor Deposition Using a Roll Coater.
SHINKU
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
Materials Science
Instrumentation
