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Publications by Ryoung-han Kim
Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists
Related publications
Progress in EUV Resists Towards High-Na EUV Lithography
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Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.
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Study of PAG Size Effect on Lithographic Performance of 157nm Resists.
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T-Boc Based Resists: A Polymeric Platform for .LEQ.0.25.MU.m Lithographic Technologies.
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Molecular Glass Resists for High-Resolution Patterning
