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Publications by S. Denorme
Highly Scalable and WF-tunable Ni(Pt)Si/SiON TOSI-gate CMOS Devices Obtained in a CMP-less Integration Scheme
Effect of Poly/SiON Gate Stack Combined With Thin BOX and Ground Plane for Low VTH and Analog Applications of FDSOI Devices
Related publications
Progress and Challenges in the Direct Monolithic Integration of III–V Devices and Si CMOS on Silicon Substrates
Scalable Hybrid Microelectronic-Microfluidic Integration of Highly Sensitive Biosensors
International Symposium on Microelectronics
3D Integration of Planar Crossbar Memristive Devices With CMOS Substrate
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
Spin-Hall Topological Hall Effect in Highly Tunable Pt/Ferrimagnetic-Insulator Bilayers
Integration of a Gate Electrode Into Carbon Nanotube Devices for Scanning Tunneling Microscopy
Applied Physics Letters
Astronomy
Physics
Synthesis of Hollow Pt-Ni Nanoboxes for Highly Efficient Methanol Oxidation
Scientific Reports
Multidisciplinary
Pt-Ni Alloy Catalysts for Highly Selective Anti-Markovnikov Alkene Hydrosilylation
Science China Materials
Materials Science
Highly Tunable and Scalable Fabrication of 3D Flexible Graphene Micropatterns for Directing Cell Alignment
