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Publications by Sang-Jun Choi
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Bioequivalence of PirosTMTablets to ActosTMTablets (Pioglitazone HCl 15 Mg)
Journal of Korean Pharmaceutical Sciences
Related publications
Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
O-Nitrobenzyl Ester Based Deep UV Resist for KrF Excimer Laser Lithography
Polymer Journal
Polymers
Materials Chemistry
Plastics
Towards 11nm Half-Pitch Resolution for a Negative-Tone Chemically Amplified Molecular Resist Platform for Extreme-Ultraviolet Lithography
Metal Containing Resist Readiness for HVM EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Study of Polymer Ablation Using ArF Excimer Laser.
Nihon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B
Condensed Matter Physics
Mechanical Engineering
Development of Lithography Based on Excimer Laser.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
The Study on Developer Containing Surfactant for ArF Lithography Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Effect of Substrate Treatments on Resist Footing in Chemically Amplified System.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics