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Publications by Stefan Möckel
Chemical Vapor Deposition of Ruthenium-Based Layers by a Single-Source Approach
Journal of Materials Chemistry C
Materials Chemistry
Chemistry
Institutional Economics of Agricultural Soil Ecosystem Services
Sustainability
Development
Management
Monitoring
Environmental Science
Renewable Energy
Energy Engineering
Law
Sustainability
Planning
Policy
Power Technology
the Environment
Geography
Related publications
Conductive Fused Porphyrin Tapes on Sensitive Substrates by a Chemical Vapor Deposition Approach
Angewandte Chemie
Temperature Dependence of Chemical-Vapor Deposition of Pure Boron Layers From Diborane
Applied Physics Letters
Astronomy
Physics
Deposition of SiO[sub 2] Layers on GaN by Photochemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Modifying the Microstructure and Morphology of Film Surface Layers by Manipulating Chemical Vapor Deposition Reactor Conditions
Journal of Applied Physics
Astronomy
Physics
Reduction of Doping and Trap Concentrations in 4H–SiC Epitaxial Layers Grown by Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Synthesis of Zirconium Diboride by Chemical Vapor Deposition
Journal of the Ceramic Association, Japan
Hot Wire Chemical Vapor Deposition of Isolated Carbon Single-Walled Nanotubes
Applied Physics Letters
Astronomy
Physics
Recent Developments in the High-Rate Growth of SiC Epitaxial Layers by the Chemical Vapor Deposition Method
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
High Speed Deposition of Y2O3 Films by Laser-Assisted Chemical Vapor Deposition
Materials Transactions
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
