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Publications by T. Gougousi

AlN/GaN Insulated Gate HEMTs With HfO2 Gate Dielectric

Electronics Letters
Electronic EngineeringElectrical
2009English

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Normally-Off P-GaN Gate InAlN/GaN HEMTs Grown on Silicon Substrates

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Surface Passivation of GaN and GaN/AlGaN Heterostructures by Dielectric Films and Its Application to Insulated-Gate Heterostructure Transistors

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2003English

Gate-Defined Quantum-Dot Devices Realized in InGaAs/InP by Incorporating a HfO2 Layer as Gate Dielectric

Applied Physics Letters
AstronomyPhysics
2009English

Low Current Collapse and Low Leakage GaN MIS-HEMT Using AlN/SiN as Gate Dielectric and Passivation Layer

ECS Meeting Abstracts
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The Characteristics of Fluorinated Gate Dielectric AlGaN/GaN MIS-HEMT

IEICE Electronics Express
Electronic EngineeringCondensed Matter PhysicsOpticalElectricalMagnetic MaterialsElectronic
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The Characteristics of Hole Trapping in HfO2∕SiO2 Gate Dielectrics With TiN Gate Electrode

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2004English

Modelling of Insulated-Gate Field-Effect Transistors.

English

60 Nm Self-Aligned-Gate InGaAs HEMTs With Record High-Frequency Characteristics

2010English

Physics-Based Insulated-Gate Bipolar Transistor Model With Input Capacitance Correction

IET Power Electronics
Electronic EngineeringElectrical
2015English

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