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Publications by Takahiko Higashi
Growth of P-Type Β-FeSi2 Polycrystalline Films by RF Magnetron Sputtering
Related publications
Cr-N Films Prepared by RF Magnetron Sputtering.
SHINKU
Computation of Heterojunction Parameters at Low Temperatures in Heterojunctions Comprised of N-Type Β-FeSi2 Thin Films and P-Type Si(111) Substrates Grown by Radio Frequency Magnetron Sputtering
Advances in Materials Science and Engineering
Materials Science
Engineering
Thermoelectric Properties of Zn0.98Al0.02O Thin Films Prepared by RF Magnetron Sputtering
Journal of the Ceramic Society of Japan
Materials Chemistry
Chemistry
Condensed Matter Physics
Composites
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Low Temperature Preparation of TiO2 Films by RF Magnetron Sputtering Method
Transactions of the Materials Research Society of Japan
Structure of Indium Nitride Thin Films Prepared by RF-magnetron Sputtering
Acta Crystallographica Section A Foundations of Crystallography
Nanocrystalline GaN and GaN: H Films Grown by RF-magnetron Sputtering
Brazilian Journal of Physics
Astronomy
Physics
Arsenic Doped P-Type Zinc Oxide Films Grown by Radio Frequency Magnetron Sputtering
Journal of Applied Physics
Astronomy
Physics
Effect of Annealing on A-Si:H Thin Films Fabricated by RF Magnetron Sputtering
Korean Journal of Materials Research
Materials Science
Hydrogen Influence on Gallium Arsenide Thin Films Prepared by Rf-Magnetron Sputtering Technique
Brazilian Journal of Physics
Astronomy
Physics
