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Publications by Tomoyoshi Kamoshita
Effects of Ion Bombardment During A-Si Based Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Related publications
Effective Sticking Coefficient Measurement of Radicals for A-SiN:H Film Growth in Plasma CVD
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Reduced Order Based Compensator Control of Thin Film Growth in a CVD Reactor
Ion Bombardment-Induced Surface Effects in Materials
Hard Carbon Film Coating by Plasma CVD.
SHINKU
Effects of Ion Bombardment on Properties of d.c. Sputtered Superhard (Ti, Si, Al)N Nanocomposite Coatings
Surface and Coatings Technology
Surfaces
Condensed Matter Physics
Interfaces
Materials Chemistry
Films
Coatings
Chemistry
The Role of Energetic Ion Bombardment During Growth of TiO2thin Films by Reactive Sputtering
Journal of Physics D: Applied Physics
Surfaces
Ultrasonics
Condensed Matter Physics
Acoustics
Optical
Magnetic Materials
Films
Coatings
Electronic
Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD
Shinku
High-Rate Growth of Defect-Free Epitaxial Si at Low Temperatures by Atmospheric Pressure Plasma CVD
Growth of One-Dimensional Si/SiGe Heterostructures by Thermal CVD
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
