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Publications by Tuomas Hänninen

SiNxCoatings Deposited by Reactive High Power Impulse Magnetron Sputtering: Process Parameters Influencing the Nitrogen Content

ACS Applied Materials & Interfaces

Materials Science

English

Silicon Oxynitride Films Deposited by Reactive High Power Impulse Magnetron Sputtering Using Nitrous Oxide as a Single-Source Precursor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Related publications

Hysteresis-Free Reactive High Power Impulse Magnetron Sputtering

Thin Solid Films

Materials Chemistry

Magnetic Materials

English

Growth of HfN Thin Films by Reactive High Power Impulse Magnetron Sputtering

English

Evolution of Sputtering Target Surface Composition in Reactive High Power Impulse Magnetron Sputtering

Journal of Applied Physics

English

High Power Impulse Magnetron Sputtering Discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Investigation of Plasma Spokes in Reactive High Power Impulse Magnetron Sputtering Discharge

Journal of Applied Physics

English

Effect of Peak Power in Reactive High Power Impulse Magnetron Sputtering of Titanium Dioxide

Surface and Coatings Technology

Condensed Matter Physics

Materials Chemistry

English

Deposition of Yttria-Stabilized Zirconia Thin Films by High Power Impulse Magnetron Sputtering and Pulsed Magnetron Sputtering

Surface and Coatings Technology

Condensed Matter Physics

Materials Chemistry

English

AlNxOy Thin Films Deposited by DC Reactive Magnetron Sputtering

Applied Surface Science

Condensed Matter Physics

English