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Publications by Yasunori Uetani
Study of PAG Size Effect on Lithographic Performance of 157nm Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Use of Supramolecular Assemblies as Lithographic Resists
Angewandte Chemie
Correlation of Lithographic Performance of the Electron Beam Resists SML and ZEP With Their Chemical Structure
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Fullerene Grafted Photoacid Generator (PAG) Bound Polymer Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists
Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers
Microelectronic Engineering
Surfaces
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Films
Nanotechnology
Optics
Coatings
T-Boc Based Resists: A Polymeric Platform for .LEQ.0.25.MU.m Lithographic Technologies.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
PAG Incorporated Polymeric Resists for Sub-100 Nm Patterning at 193 Nm Exposure
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Effect of Egg Size and Strain on Growth Performance of Cockerel
Agriculture and Biology Journal of North America
