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Publications by Yongchan Ban
Electrical Impact of Line-Edge Roughness on Sub-45nm Node Standard Cell
Related publications
Understanding the Effect of Laser Anneal on LSTP 45nm Node MOS Transistor Electrical Parameters
Special Section Guest Editorial: Line-Edge Roughness
Journal of Micro/ Nanolithography, MEMS, and MOEMS
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Analytic Estimation and Minimization of Line Edge Roughness in Electron-Beam Lithography
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
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Effect of Double-Patterning and Double-Etching on the Line-Edge-Roughness of Multi-Gate Bulk MOSFETs
IEICE Electronics Express
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Chemically Amplified Main Chain Scission: New Concept to Reduce Line Edge Roughness and Outgassing.
Journal of Photopolymer Science and Technology
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Impact of Lymph Node Management on Resectable Non-Small Cell Lung Cancer Patients
Journal of Thoracic Disease
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Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
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Cell Edge Detector: Recovering Length Information From Line-Scan Confocal Images
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Physical Review B