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Publications by Joanne F. Sia
Characterization of BCl3/N2 Plasmas
Journal of Applied Physics
Astronomy
Physics
Related publications
Characteristics of Inductively Coupled Cl2/BCl3 Plasmas During GaN Etching
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Electrical Characterization of Rf Plasmas
Detailed Study of the Plasma-Activated Catalytic Generation of Ammonia in N2-H2 Plasmas
Journal of Applied Physics
Astronomy
Physics
Measurement and Modeling of Neutral, Radical, and Ion Densities in H2-N2-Ar Plasmas
Journal of Applied Physics
Astronomy
Physics
Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas
Journal of Physical Chemistry A
Medicine
Theoretical Chemistry
Physical
N2 Vibrational Temperatures and Oh Number Density Measurements in a Ns Pulse Discharge Hydrogen-Air Plasmas
Radiative Characteristics of N2 Second Positive Bands in High-Temperature Plasmas (Analysis With Predissociation and Non-Boltzmann Rotational Population Distribution)
Nihon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B
Condensed Matter Physics
Mechanical Engineering
The N2-Fixing Bacterium From the Apoplast of Sugarcane: Localization, Isolation and Characterization.
Numerical Investigation of the Kinetics and Chemistry of Rf Glow Discharge Plasmas Sustained in He, N2, O2, He/N2/O2, He/Cf4/O2, and SiH4/NH3using a Monte Carlo‐fluid Hybrid Model
Journal of Applied Physics
Astronomy
Physics
