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Publications by Naomichi Abe
Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Designing High Performance KrF and ArF Single Layer Resists With Methacrylate Polymers.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Use of Supramolecular Assemblies as Lithographic Resists
Angewandte Chemie
A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
T-Boc Based Resists: A Polymeric Platform for .LEQ.0.25.MU.m Lithographic Technologies.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Study of PAG Size Effect on Lithographic Performance of 157nm Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists
Correlation of Lithographic Performance of the Electron Beam Resists SML and ZEP With Their Chemical Structure
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Fullerene Grafted Photoacid Generator (PAG) Bound Polymer Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
