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Publications by T. E. F. M. Standaert

Influence of Reactor Wall Conditions on Etch Processes in Inductively Coupled Fluorocarbon Plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1998English

Characterization of Al, Cu, and TiN Surface Cleaning Following a Low-K Dielectric Etch

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
1999English

Related publications

Etch Characteristics of Optical Waveguides Using Inductively Coupled Plasmas With Multidipole Magnets

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1999English

Characteristics of Inductively Coupled Cl2/BCl3 Plasmas During GaN Etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1999English

Two-Dimensional Simulation of a Miniaturized Inductively Coupled Plasma Reactor

Journal of Applied Physics
AstronomyPhysics
2004English

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Electrochemical and Solid-State Letters
2008English

Transient Plasma Potential in Pulsed Dual Frequency Inductively Coupled Plasmas and Effect of Substrate Biasing

AIP Advances
NanotechnologyAstronomyPhysicsNanoscience
2016English

Fundamental Study on Filter Effect of Confronting Divergent Magnetic Fields Applied to Low-Pressure Inductively Coupled Plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
EngineeringAstronomyPhysics
2016English

Pulsed Inductively Coupled Plasmas as a Method to Recoup Uniformity: Three-Dimensional Modeling Study

Applied Physics Letters
AstronomyPhysics
2004English

Energetic Electron Avalanches and Mode Transitions in Planar Inductively Coupled Radio-Frequency Driven Plasmas Operated in Oxygen

Applied Physics Letters
AstronomyPhysics
2011English

Investigations of the Surface Chemistry of Silicon Substrates Etched in a Rf-Biased Inductively Coupled Fluorocarbon Plasma Using Fourier-Transform Infrared Ellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1998English

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