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Publications by Atsushi Seino
Reduction of Interface State Density at SiO2 /InAlN Interface by Inserting Ultrathin Al2 O3 and Plasma Oxide Interlayers
Physica Status Solidi (B): Basic Research
Optical
Electronic
Condensed Matter Physics
Magnetic Materials
Related publications
Effect of Insertion of Ultrathin Al2 O3 Interlayer at Metal/GaN Interfaces
Physica Status Solidi (B): Basic Research
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Condensed Matter Physics
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Mechanical Stability of Ultrathin Ge∕Si Film on SiO2: The Effect of Si∕SiO2 Interface
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Interface-Dependence of Nucleation and Self-Assembly of Ultrathin Iron Oxide Films
Materials Research Society Symposium - Proceedings
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Study of SiO2/Si Interface by Surface Techniques
Surface State Capture Cross-Section at the Interface Between Silicon and Hafnium Oxide
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Interface Engineered Room‐Temperature Ferromagnetic Insulating State in Ultrathin Manganite Films
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Study of High Temperature Reaction Between Ti and SiO2 at Interface in Ti/SiO2/TiSi2/Si System by XPS.
SHINKU
Depth-Dependent Spectroscopic Defect Characterization of the Interface Between Plasma-Deposited SiO2 and Silicon
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Structures and Electronic States of Si/SiO2 Interface.
Hyomen Kagaku