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Publications by Danilo De Simone
Metal Containing Resist Readiness for HVM EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of EUV Resist Performance Using Interference Lithography
EUV Lithography
Synchrotron Radiation News
High Energy Physics
Nuclear
Optics
Atomic
Molecular Physics,
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Metallic Resist for Phase-Change Lithography
Scientific Reports
Multidisciplinary
EUV Light Sources for Next-Gen Lithography
Optics and Photonics News
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
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Progress in EUV Resists Towards High-Na EUV Lithography
High-Sensitivity Molecular Organometallic Resist for EUV (MORE)
Approach to EUV Lithography Simulation
