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Publications by Geert Vandenberghe
Metal Containing Resist Readiness for HVM EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of EUV Resist Performance Using Interference Lithography
EUV Lithography
Synchrotron Radiation News
High Energy Physics
Nuclear
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Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Metallic Resist for Phase-Change Lithography
Scientific Reports
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EUV Light Sources for Next-Gen Lithography
Optics and Photonics News
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Progress in EUV Resists Towards High-Na EUV Lithography
High-Sensitivity Molecular Organometallic Resist for EUV (MORE)
Approach to EUV Lithography Simulation
