Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by J. T. Lim
Characteristics of SiO[sub X] Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS∕O[sub 2]∕He
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Related publications
Characteristics of Diamondlike Carbon Film Deposited by Magnetron Plasma Enhanced Chemical Vapor Deposition Using a Roll Coater.
SHINKU
Deposition of SiO[sub 2] Layers on GaN by Photochemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Processing of PbTiO{sub 3} and Pb(Zr{sub X}Ti{sub 1{minus}x})O{sub 3} Thin Films by Novel Single-Solid-Source Metalorganic Chemical Vapor Deposition
Weatherability of Amorphous Carbon Films Synthesized by Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition
Sensors and Materials
Materials Science
Instrumentation
Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Characteristics of Er-Doped Al/Sub 2/O/Sub 3/ Thin Films Deposited by Reactive Co-Sputtering
IEEE Journal of Quantum Electronics
Electronic Engineering
Condensed Matter Physics
Molecular Physics,
Electrical
Atomic
Optics
Preparation of Cubic Boron Nitride Thin Film by the Helicon Wave Plasma Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics