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Publications by James Pasarelli
Low-Ler Tin Carboxylate Photoresists Using EUV
Related publications
Current Status of EUV Photoresists
Journal of Photopolymer Science and Technology
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Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists
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Photoresists Stripping Using Dielectric Barrier Glow Discharge Plasma System
Development of an Efficient EUV Source by Use of a Liquid Tin Oxide Micro-Target
The Review of Laser Engineering
Evaluation of EUV Resist Performance Using Interference Lithography
Low-Speckle Holographic Beam Shaping of High-Coherence EUV Sources
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