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Publications by Levi Dousharm
High-Sensitivity Molecular Organometallic Resist for EUV (MORE)
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Evaluation of Resist Capability for EUV Lithography
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Metal Containing Resist Readiness for HVM EUV Lithography
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Advancements in EUV Resist Materials and Processing
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High Resolution Positive-Working Molecular Resist Derived From Truxene
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Progress in EUV Resists Towards High-Na EUV Lithography
